* (xing) P(gun)]
XP2100}FP͏(f)τ (yng)ϣ ^P ڵV܄
ӆ؛ǧˣ
r(ji)
20
55.00Ԫ/
200
52.00Ԫ/
1000
50.00Ԫ/
(yng)(bio)}XP2100}FP͏(f)τ (yng)ϣ ^P ڵV܄
r(ji)늃x
l(f)˾ϣh(hun)Ƽ(yng)˾
؛99999
(lin)ϵˣwŮʿ
l(f)؛c(din) (yng) ^(q)
l(f)r(sh)g20240808
Ч20241007
ھԃPھԃP
a(chn)ƷCϢ|(zh)δӋ(j)
Ϣ
XP2100
}FP͏(f)τ
XP2100}FP͏(f)τ
a(chn)Ʒf(shu)
?XP2100^ˮÓQͷP(f)τڵVͼ܄γɱϞ?zi)ṩ?yu)ԽˮÓQcP
?XP2100ͨ^(gu)ASTM B-117}Fԇ(yn)r(sh)g_(d)96Сr(sh)}Fh(hun)ṩ(yu)ԽķP
?XP2100ճ(du)ɫټɫٲg
?XP2100ڭh(hun)ʯϞͼN܄У5%-25%
?XP2100mڽnˢͿ͇F
?XP2100ͨ^(gu)M(jn)ϞĽMЧĽ˂y(tng)P͵Ěζ
͔(sh)(j)
^25棩 ɫϞw
ܶȣ15棩 0.92
Wc(din) >160
c(din) 45
ֵ mg KOH/g 12
ܽdw Vú܄
䷽
XP2100 -----------8-20%
V ----------5-20%
܄ -----------60-82%
8%(bio)(zhn)}Fԇ(yn)48Сr(sh)
ϣh(hun)Ƽ(yng)˾Ϣ
ϣh(hun)Ƽ(yng)˾һҌTh(hun)ՃI(y)ӄԼܻW(xu)Ʒаl(f)N۵Ĺ˾жĘI(y)(jng)(yn)ͺYԴ(yu)(sh)͑xԃr(ji)ȵĮa(chn)Ʒm˵ĽQԼƵķ(w)֧֡ ϣϣѵϣƼڴɞҌ(sh)Ѻͺ顣@҂˾ijԣҲ҂һ؞(jin)ֵĽ(jng)I(yng)B(ti)҂\(chng)(sh)ڄ¿(hu)õ؈(bo)҂Ŀ(bio)dzɞӯĹ˾ڴɞ͑M飬K(sh)F(xin)c͑pAԼc(yng)̵pA
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