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ϣh(hun)Ƽ(yng)޹˾ > ԭo > XP2100}FP͏(f)τ (yng)ϣ ^P ڵV܄

XP2100}FP͏(f)τ (yng)ϣ ^P ڵV܄

  • XP2100}FP͏(f)τ (yng)ϣ ^P ڵV܄
  • XP2100}FP͏(f)τ (yng)ϣ ^P ڵV܄S
  • ӆ؛ǧˣ

    r(ji)񣨲

  • 20

    55.00Ԫ/

  • 200

    52.00Ԫ/

  • 1000

    50.00Ԫ/

  • (yng)(bio)}XP2100}FP͏(f)τ (yng)ϣ ^P ڵV܄

    r(ji)늃x

    l(f)˾ϣh(hun)Ƽ(yng)޹˾

    ؛99999

    “(lin)ϵˣwŮʿ

    l(f)؛c(din) (yng) ^(q)

    l(f)r(sh)g20240808

    Ч20241007

    ھԃ

    ھԃPھԃP

    a(chn)ƷCϢ|(zh)δӋ(j)

ܰѣՈ(qng)M(fi)Ì(du)(gu)HķߴʩƷҪM(jn)ƷCһ(bo)棨؛SC뾳zCA(y)C¹ڲzy(c)(bo)棩

鿴ͬa(chn)Ʒ

44147
  • Ʒƣϣ
  • S(a(chn))(yng)
  • ̖(ho)XP2100
  • ܣ
  • ;ˮÓQͷP(f)τmڽnˢͿ͇F
  • 5
  • ܣǽ컯b蹤̲ϵĺ(jin)Q߂䃞(yu)͸g

    ;C(j)еxܵ͘(gu)

    ӢChemical Materials

    P(gun)]

    Ϣ

    XP2100

    }FP͏(f)τ

    XP2100}FP͏(f)τ

    a(chn)Ʒf(shu)

    ?XP2100^ˮÓQͷP(f)τڵVͼ܄γɱϞ?zi)ṩ?yu)ԽˮÓQcP

    ?XP2100ͨ^(gu)ASTM B-117}Fԇ(yn)r(sh)g_(d)96Сr(sh)}Fh(hun)ṩ(yu)ԽķP

    ?XP2100ճ(du)ɫټ󲿷ɫٲg

    ?XP2100ڭh(hun)ʯϞͼN܄У5%-25%

    ?XP2100mڽnˢͿ͇F

    ?XP2100ͨ^(gu)M(jn)ϞĽMЧĽ˂y(tng)P͵Ěζ

    ͔(sh)(j)

    ^25棩 ɫϞw

    ܶȣ15棩 0.92

    Wc(din) >160

    c(din) 45

    ֵ mg KOH/g 12

    ܽdw Vú܄

    XP2100 -----------8-20%

    V ----------5-20%

    ܄ -----------60-82%

    8%(bio)(zhn)}Fԇ(yn)48Сr(sh)

    ϣh(hun)Ƽ(yng)޹˾Ϣ

    ϣh(hun)Ƽ(yng)޹˾һҌT­h(hun)ՃI(y)ӄԼܻW(xu)Ʒаl(f)N۵Ĺ˾жĘI(y)(jng)(yn)ͺYԴ(yu)(sh)͑xԃr(ji)ȵĮa(chn)Ʒm˵ĽQԼƵķ(w)֧֡ ϣϣѵ󡱣ϣƼڴɞҌ(sh)Ѻͺ顣@҂˾ijԣҲ҂һ؞(jin)ֵĽ(jng)I(yng)‘B(ti)҂\(chng)(sh)ڄ¿(hu)õ؈(bo)҂Ŀ(bio)dzɞӯĹ˾ڴɞ͑M飬K(sh)F(xin)c͑pAԼc(yng)̵pA

    I(yng)a(chn)ƷټӹҺӄ,(rn)ӄ,ĩ,ĥ,Ԅ,(f)τ ˾ݣ2019
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    XP2100}FP͏(f)τ (yng)ϣ ^P ڵV܄


    XP2100}FP͏(f)τ (yng)ϣ ^P ڵV܄a(chn)Ʒśr

    nbsp;ϣchemicalengineeringmaterials컯b蹤̲ϵĺ(jin)QMɻa(chn)bõĻC(j)еxܵ͘(gu)ﶼڲͬض͙C(j)еؓ(f)\(yn)D(zhun)|ֶЏ(qing)gϳ(yng)һ㹤̲ϵ߀(yng)߂䃞(yu)͸gܡ͸gֱܲӰbõĉЕr(sh)߀(zi)ը¹߀(hu)Ӱ푮a(chn)ƷĮa(chn)|(zh)(j)ͬ;ʹ×lЕr(sh)߀Ҫ󻯹Ͼ͸ߜػ͵͜(do)ܡڻa(chn)Ϻ͹ˇlͬϵƷN̖(ho)Ҏ(gu)(f)sȰһ㹤̲ҲbÌõľܡ;IJ
    (yng)

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