SҶƄzt
(yng)(bio)}SҶƄzt
r늃x
l(f)˾|ݸк\W(xu)Ʒ˾
؛10000000
(lin)ϵˣС
l(f)؛c(din)V| |ݸ |ݸ
l(f)rg20211014
Ч20211113
ھԃ
ھԃPھԃP
a(chn)ƷCϢ|(zh)δӋ
ܰѣՈM(fi)ÌHķߴʩƷҪM(jn)ƷCһ棨؛SC뾳zCA(y)C¹ڲzy棩
鿴ͬa(chn)Ʒ
\W(xu)Ʒ˾2004һн(jng)(yn)O(sh)ӋW(xu)ĸ߿ƼI(y)˾(jng)^İl(f)չγ˼аl(f)O(sh)Ӌӹz(yn)Mbۺ(w)һwϵаW(xu)(zhn)_a(chn)O(sh)ͨ^(sh)ʩƌW(xu)Ĺwϵ˾߂Ѹٷ(yng)Јa(chn)˾Ўʮ˽MɵO(sh)Ӌаl(f)ģϮa(chn)Ʒ(j)͑Ҫаl(f)®a(chn)ƷõĹW(xu)O(sh)N͑O(sh)ӋAˇ(ni)͑هҹ˾ڇ(ni)Јкܸߵռh(yun)NWձn|ρЖ|^s@|ݸӋԺ(w)I(y)ЇӋƌW(xu)оԺ(bio)(zhn)ߺI(y)ЇLC(j)(sh)@g(sh)˾A|Aυ^(q)Șsu(y) ˾ͨ^LcW(xu)xW(xu)C(j)еO(sh)I(y)γϵлW(xu)a(chn)ƷY(ji)(gu)O(sh)Ӌܸ(j)͑ӆƸN(zhn)_W(xu)˾Įa(chn)Ʒ:R^ųߡyֳyУƬ(bio)壩ƽƽƽNRpRRRք_ͶӰ(sh)@aȮa(chn)Ʒнb䓻ɫĥɰпղNˇb ˾ʼKء|(zh)ǰÑ\ȡšּ\(ni)͑ṩĮa(chn)Ʒ͵ķ(w)Қgӭѵ˾늻ǢՄI(y)(w)yֹM(jn)(chung)xͣ
Ϣ
zt Photomask substrates
Ԕ(x)f
ztһNӲģĤǮ(dng)ǰδ(x)ӹĤйϣஔ(dng)õĸйzƽ߹❍ȵIJͨ^ֱſ؞R䣨SPeϵt-tĤγtĤ棬Ϳһӹ¿gַQzgƳɄztztĤĻģ
ԣztиߵĸй`߷ֱʡȱc(din)ܶĥԺá坍̎ʹÉLc(din)
(yng)
a(chn)ƷV(yng)ڰ댧(do)w·оƬ졢·ܶ댧(do)wԪ@ʾW(xu)ИI(y)Ĥܶӡƾ·壨PCBИI(y)
|ݸк\W(xu)Ʒ˾Ϣ
Ia(chn)ƷԪӰyx,I(y)׃R^,(bio),ֱʰ,У(zhn)y,ֳ,a(b),ֹRƬ,R,R,R,ƽƽ,ƽƽ,W(xu)_,ͶӰ,ZSyԇx ˾ݣ2010
˾W(wng)ַhttp://hcgxcy.glass.com.cn
^(q)V| |ݸ |ݸ
W(wng)ַ: http://hcgxcy.glass.com.cn
a(chn)Ʒԣ
ӋλK ؛10000000 Сӆ1 a(chn)Ʒr200.00 Ʒƣ Ҏ(gu)̖ bf
SҶƄzt a(chn)Ʒśr
W(xu)ǹ늼g(sh)a(chn)I(y)ĻA(ch)ҪMɲ֡e20o(j)90ԺSW(xu)cϢƌW(xu)²ϿƌW(xu)IJںӻA(ch)ϵĹW(xu)ڹݔ⃦@ʾI(lng)đ(yng)øͻwM(jn)ɞϢǹϢg(sh)l(f)չĻA(ch)l֮һ(j)2013-2017ЇW(xu)ИI(y)a(chn)NcͶYA(y)y桷(sh)(j)@ʾS(ni)(jng)(j)m(x)(wn)l(f)չЇW(xu)ИI(y)l(f)չѸ(j)ҽy(tng)Ӌ?jn)?sh)(j)@ʾ2010W(xu)ИI(y)Ҏ(gu)ģI(y)(sh)_(d)246ИI(y)ȫꌍ(sh)F(xin)N234.05|ԪͬL53.70%;(sh)F(xin)15.37|ԪͬL87.10%;Ya(chn)Ҏ(gu)ģ_(d)264.50|ԪͬL77.49%ڹW(xu)ИI(y)ԇ(ni)N۞ΣC(j)Ӱ^СИI(y)ȻF(xin)^õL^